Surface Topography of Si/TiO2 Stacked Layers on Silicon Substrate Deposited by KrF Excimer Laser Ablation
نویسندگان
چکیده
This study investigates the surface topography of deposited thin films versus distance between target and substrate (dTS) inside a laser ablation equipment. The profile rough was obtained by atomic force microscopy data analysis based on power spectral density roughness-length scale (RLS) functions. roughing top film is analyzed considering previous underneath for each consecutive TiO2 Si deposition onto (100) wafer. buried oxide layer Si/TiO2/c-Si structure, KrF excimer characterized complementary techniques as ellipsometry, X-ray reflectometry, diffraction.
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ژورنال
عنوان ژورنال: Coatings
سال: 2021
ISSN: ['2079-6412']
DOI: https://doi.org/10.3390/coatings11111350